SHENZHEN SUNRISE METAL INDUSTRY CO.,LT

SPUTTERING TARGETS

THIN FILMS

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Sputtering is a process where energetic ions eject atoms from a solid target material. This process is used commonly for thin film deposition. The two largest industries which utilize sputtering technology are the semiconductor industry in the production of computer memory chips and the optical coatings industry for the production of antireflective coatings.

Shenzhen Sunrise Metal Industry Co.,LtdIn addition to tantalum, Shenzhen Sunrise Metal Industry Co.,Ltd also supplies sputtering targets in niobium, titanium, tungsten, molybdenum, hafnium, silicon and some of their oxides. All our productsareengineered specifically to perform reliably in thin film depositions. Our manufacturing process ensures the target’s grain and texture are free from banding. We offer a wide selection of purities and shapes.AVAILABLE TARGET MATERIALS

Material	Symbol	Best Purity, wt%
Chromium	Cr	99.95
Hafnium	Hf	99.95 with Zr 0.5 max
Indium Tin Oxide (ITO)	In2O3-SnO2	99.99
Molybdenum	Mo	99.99
Niobium	Nb	99.98
Niobium oxide (pentoxide)	Nb2O5	99.99
Niobium Titanium alloys	NbTi	99.95

Material	Symbol	Best Purity, wt%
Silicon	Si	99.999
Tantalum	Ta	99.999
Tantalum oxide (pentoxide)	Ta2O5	99.99
Niobium Alloys	NbTi, NbNi	99.95
Tantalum Alloys	TaW, TaNb	99.99
Titanium	Ti	99.5
Tungsten	W	99.99